Intel euv roadmap Intel. Feb 21, 2024 · Intel unveiled a new roadmap that includes a new 14A node, the industry’s first to use High-NA EUV, here at its Intel Foundry Services (IFS) Direct Connect 2024 event. He expects that Intel will adopt EUV for a 10-nm+ upgrade in 2019. Intel Process Roadmap Q2 2024 Jul 29, 2024 · So far, 2024 has been a banner year for high-numerical aperture EUV lithography. The new tool has the ability to dramatically improve resolution and feature scaling for next-generation processors by changing the optics design for projecting Jul 26, 2021 · derived from a standard full node. Q&A Ross Seymore, Deutsche Bank: Asked about the roadmap for the data Feb 21, 2022 · In my opinion these are all good moves on Intel’s part. About Intel Jul 29, 2024 · TSMC has revealed its High-NA EUV lithography machine roadmap: next-gen A14 process node in Q3 2027, A14P process node arrives in 2028. Feb 22, 2024 · それがIntel 14Aで、高NA EUV(High-NA EUV)と呼ばれる、さらに微細化されるEUV(Extreme Ultra-Violet、極端紫外線)を利用したプロセスノードになるという。 Sep 21, 2023 · Following some changes in Intel’s process roadmap – in particular Intel 18A being pulled in because it was ahead of schedule – Intel’s plans for the next-generation EUV machines. “Intel’s focus is to stay at the forefront of semiconductor lithography technology and we’ve been building Title: Intel’s Core Strengths Maximize the Benefits of High NA EUV Author: Intel Corporation Created Date: 4/16/2024 9:37:28 AM Feb 21, 2024 · Beyond that lies Intel 14A — the company’s smallest node yet, thanks to High-NA EUV. Mar 28, 2025 · Intel Process Roadmap. High-NA EUV is needed to avoid 0. “Intel’s focus is to stay at the forefront of semiconductor lithography technology and we’ve been building Jan 18, 2022 · Investor Day, ASML shared its EUV roadmap and indicated that High-NA technology is expected to start supporting production manufacturing in 2025. Beyond Intel 3, the company is working on Intel 20A. Although 12nm half-pitch is optically resolvable by 0. Also, 20a and 18a nodes are “back on track for process leadership this year,” Orr said. 55NA EUV alongside other lithography processes in developing and manufacturing advanced chips, starting with product proof points on Intel 18A in 2025. Intel 7 and Intel 4 have been completed, with Intel 3, 20A, and 18A coming in the next Feb 27, 2024 · Intel shared an updated production roadmap that has its 1nm (10A) process arriving in late 2027. Intel's shares fell 9% after reporting mixed Q1 results and providing a weaker-than-expected outlook for the coming quarter. Apr 18, 2024 · Intel’s TWINSCAN EXE:5000 High NA EUV tool from lithography leader ASML is now going through calibration steps in preparation for production of Intel’s future process roadmap. Larger, anamorphic optics for sharper imaging. 33 NA family: upgrades possible to optimize capital efficiency Jan 19, 2022 · “Intel’s vision and early commitment to ASML’s High-NA EUV technology is proof of its relentless pursuit of Moore’s Law. 5 nm. Process Name Intel 14A-E Intel 14A Intel 18A Intel 20A Intel 3 Intel 4 EUV: TBD: High-NA EUV: Yes: Yes: Yes: Yes: N/A: N/A: Transistor Architecture: TBD: TBD: Optimized See full list on anandtech. Dec 31, 2022 · 2022年1月18日: Intel Retail Study The Pandemic’s Effect on Consumer Behavior; 2022年1月21日: 高 NA極端紫外線（EUV） による 2025年の量産開始を目指し、 インテル コーポレーションとASMLが提携を強化 Dec 6, 2018 · Intel’s Xeon Scalable Roadmap Leaks: Cooper Lake-SP, Ice Lake-SP Due in 2020 Samsung Starts Mass Production of Chips Using Its 7 nm EUV Process Tech TSMC: First 7 nm EUV Chips Taped Out, 5 nm Apr 18, 2024 · This in turn will allow Intel to develop chips with the most innovative features and capabilities – processors that are essential for driving advancements in AI and other emerging technologies. Compared to the current EUV systems, our innovative extended EUV roadmap delivers continued lithographic improvements at reduced Mar 30, 2022 · Early EUV researchers pursued several wavelengths ranging from 4 to 40, but eventually settled on 13. , Ltd. Taiwan Semiconductor Manufacturing Apr 18, 2024 · Intel’s TWINSCAN EXE:5000 High NA EUV tool from lithography leader ASML is now going through calibration steps in preparation for production of Intel’s future process roadmap. Intel's 'A' suffix in its node Dec 31, 2022 · About Intel. 55. Alongside briefing the press about the D1X-Mod3 opening, Intel also used their latest press event to get everyone up to speed on the latest Intel jumping on-board to be the first to buy these machines is highly motivated by lessons learned from the 10nm debacle. But Intel said it would extend the 193-nm tools down to the 65-nm node, due to technical issues and delays with the 157-nm scanners. 33 NA EUV tools, Intel has adopted 0. EUV lithography relies on high-energy laser sources to generate extreme ultraviolet light at a wavelength of 13. 16 story ). If it can stay on pace, the company will move to the Intel 3, 20A, and 18A Jun 14, 2024 · Intel Foundry installed the industry's first High-NA EUV lithography machine -- made by ASML -- with Intel saying the new High-NA EUV lithography machine will allow the company to dramatically Apr 5, 2024 · Intel semiconductor manufacturing process technology roadmap. Intel announced in April 2024 that its R&D team at its R Intel revealed at Intel Foundry Direct Connect '24 an extended process technology roadmap adding: Intel 14A to the company’s leading-edge node plan, Several specialized node evolutions for Intel 3, Intel 18A, and Intel 14A, including Intel 3-PT with through-silicon vias for 3D advanced packaging designs, and Apr 11, 2022 · Intel Roadmap Update: Intel 18A Moved Up to H2 2024. While leading EUV chipmakers like TSMC can likely extend scaling for several more nodes using multi-patterning with existing 0. • Intel plans to develop its EUV masks in-house, and to that end has successfully established an EUV mask pilot line, including the world’s first commercial EUV mask making tools, an e-beam mask repair tool and a mask blank defect inspection tool. Companies. Today's announcement is consistent with this roadmap. Is that actually true? The direct competitor to Intel 10nm is TSMC N7, which is an overall similar process - DUV, multiple patterning etc. Intel plans to begin production of 18A-based chips in 2025, marking a major milestone in the company’s roadmap for advanced chip fabrication. Then, Intel was expected to use both 193- and 157-nm tools at 45-nm, but EUV was pushed out due to technical delays (see Feb. Zum Hauptinhalt wechseln Jul 29, 2023 · CEO Pat Gelsinger reaffirmed Intel’s CPU roadmap during the earnings call, stating that all advanced process nodes are on track and will release as per the original schedule. Some people also call it a Jan 25, 2024 · 1. 7nm logic is EUV Galaxy Note 10 first product with Exynos 9825 EUV CPU in 2019 Galaxy S20 with Exynos 990 in 2020 EUV capacity tripling in 2020 DRAM EUV Roadmap 2020 ⎻D1x used for customer qual ⎻D1z 1 level ⎻D1α/D1β>90% critical 7nm+ has EUV at ~3 levels ⎻First: Kirin 990, Huawei Mate30 phone in 2019 5nm uses EUV at >10 levels Jun 15, 2017 · Courtesy Britt Turkot, INTEL, 2016-10-25 15 June 2017 Slide 4 Public . Intel ASML High NA EUV Testable Main Modules. Apr 9, 2024 · How will Intel Foundry (IF) return to the forefront? Is 2024 the time when Intel will catch up with TSMC's 2nm? EUV Intel roadmap Samsung TSMC. Source Power Improvements Meeting Roadmap Britt Turkot/ Intel • Source power meets 2016 roadmap target • Emphasis now should be ensuring sufficient power overhead for quality output Updated from 2016 EUVL Workshop 2016 International Symposium on EUV Lithography, 24 October 2016, Hiroshima, Japan Steven L Carson / Intel 2020 Source Workshop 29 Increasing source power drives need for higher doses Throughput is a function of EUV power at the wafer plane and the applied dose Dose/Power = J/W = time For a constant dose, as the power is increased, the exposure time is decreased Source power is delivered by pulses, so for a constant rep rate Jul 28, 2021 · Intel 3 利用進一步的 FinFET 優化和增加的 EUV，與 Intel 4 相比，每瓦性能提高了約 18%，並進一步改進了面積。Intel 3 將準備在 2023 年下半年開始製造產品。也就是，英特爾首次宣布的 Intel 3nm 預計2023年下半年投片量產，也與台積電3nm於2022年下半年差了1年。 Jun 24, 2022 · At the 2022 SPIE Advanced Lithography Conference, ASML presented an update on EUV. 33 NA EUV systems are the production workhorse systems for leading edge lithography today. More EUV, and pre-EUV process nodes in 2030. To watch a replay of today’s webcast, visit the Intel Newsroom or Intel’s investor relations website. But I will leave it there since I already commented on why there are plenty of non economic and non tool quantity reasons for TSMC to not use it on N2/A16. EUV Roadmap. May 23, 2003 · Under that roadmap, there is no change at the 90-nm node. And efforts are underway at Intel, imec, ASML, IBM, and soon at TSMC, to shore up the resist stack, EUV mask technology, and first processes for the new scanner. 33 NA mask splits, eliminates the cumulative EPE for mask splits, reduces process complexity and lowers cost. 4nm process node Intel’s 18A node gets most of the spotlight recently – with an ongoing battle between TSMC’s and Intel’s management teams on the merits of TSMC N2 vs Intel’s 18A. 5 nm wavelength of light to print incredibly small features on silicon. This will then move on to Intel’s 14A process in 2026, according to materials shown by Intel. The ‘NA’ in the name refers to numerical aperture – a measure of the ability of an optical system to collect and focus light. This is a vast improvement over prior technology that used light at a wavelength of 193nm. com Jul 26, 2021 · Intel's 18A will be the inflection point for using High NA EUV, which is a new ultra-precise version of EUV machines that can etch designs at smaller (<8nm) resolutions than current machines. com | Partner Stories on Intel. Intel (Nasdaq: INTC) is an industry leader, creating world-changing technology that enables global progress and enriches lives. Jan 19, 2022 · Intel was the first to purchase the earlier TWINSCAN EXE:5000 system in 2018, and with the new purchase announced today, the collaboration continues the path for Intel’s production manufacturing with High-NA EUV beginning in 2025. Intel Foundry has taken delivery of a high-NA EUV scanner. Apr 18, 2024 · Intel said its TWINSCAN EXE: 5000 High NA EUV tool was built by the Dutch chipmaking equipment manufacturer ASML Holding NV, before being assembled at its research and development facility in Jun 13, 2024 · Resist materials may also need to become thinner to maintain resolution. The final proof point is Intel’s view of what being a foundry means May 2, 2024 · Summary. 5 as the sweet spot for generating EUV light with tin plasma. 55 High-NA to avoid these complexities. Intel’s ambitious five-nodes-in-four-years (5N4Y) roadmap remains on track, showcasing the company’s commitment to rapid innovation. Dec 31, 2023 · About Intel. 33 is the current woedge semiconductor rkhorse for leading-manufacturing. Intel 3 also met its defect density and performance milestones for Apr 19, 2024 · Intel expects to use both 0. Compared to the current EUV systems, our innovative extended EUV Dec 31, 2022 · About Intel. Jul 26, 2021 · Intel’s 2023 consumer processor, Meteor Lake, has already been described above as using an Intel 4nm compute tile, taking advantage of EUV. These light sources are notoriously inefficient, with much of the energy lost before it reaches the wafer. News Byte: With High NA EUV, Intel Foundry Opens New Frontier in Chipmaking; News: First EUV Light Marks Intel 4 Milestone in Ireland Apr 30, 2024 · That would be like saying TSMC rejected EUV because intel/IBM got the first development tools and Samsung had a roadmap with an earlier intercept. • Intel is actively working with the industry on the timely development Aug 5, 2021 · Intel has also partnered with semiconductor gear vendor ASML on the development of new high-numerical aperture (NA) EUV tools that can scorch smaller transistors into chips faster and more Jul 27, 2021 · Intel 7の後継となるのが、2022年後半から製造を開始し、2023年に出荷される製品に採用される予定のEUVを全面的に採用した「Intel 4」だという。 Nov 16, 2017 · The 7nm node is the first EUV node. ASML’s latest update suggests that it expects customers to be using High-NA for production in 2025/2026, which means that Jan 19, 2022 · Intel was the first to purchase the earlier TWINSCAN EXE:5000 system in 2018, and with the new purchase announced today, the collaboration continues the path for Intel’s production manufacturing with High-NA EUV beginning in 2025. Feb 17, 2022 · Intel Shares Roadmap For High NA EUV Chipmaking Machines Crucial For Leadership In Semiconductor Manufacturing. With Intel 20A, you plan to introduce a RibbonFET in 2024. “Intel’s focus is to stay at the forefront of semiconductor lithography technology and we’ve been building Jun 14, 2018 · A roadmap should be proposed in the photoresist community to set targets and priorities. With the introduction of 300mm Oregon became the only development site for Intel with large… Reticle Defectivity Risks Worsen with EUV Extensions Even at relatively high-yielding reticle defect rates and sufficient inspection containment at a single layer, extension of EUV to more layers risks much higher yield loss As EUV gets introduced into “brighter” applications, risk from reticle defects worsens Aug 23, 2021 · SE: Intel recently disclosed its new logic roadmap. it is only mentioned that 14A nodes will be the first to utilize the High-NA EUV technology but it looks Jun 5, 2024 · New Development of EUV Materials and MI solutions for High NA Mask (Keynote) In-Yong Kang, Sukjong Bae, Sanguk Park, Hyonseok Song, Jin Choi Samsung Electronics Co. Jan 19, 2022 · Intel is clearly behind its rivals TSMC and Samsung with the first generation of extreme ultraviolet (EUV) lithography technology, but it certainly wants to be the first to adopt the next Jul 26, 2021 · Current EUV systems are NA 0. One data point is that EUV is on-track to have 250W source power, which has always been a requirement from the foundries to be able to use EUV in HVM. EUV wasn’t the only technology that researchers explored to enable future generations of ‘shrink’. Intel 18A still uses low NA EUV and was never on high NA EUV. High NA EUV processes are still in development and Intel’s current plan is to use it for 14A with the qualifier “if they get high Feb 21, 2024 · The five nodes in four years roadmap is still in place, he reiterated, noting that Intel 7 and 4 are now selling in market, while Intel 3 is ready for high volume production. Winning… Mar 1, 2023 · EUV Tech, a global leader in the production of metrology equipment to enable leading-edge semiconductor manufacturing using extreme ultraviolet lithography (EUVL), secured Series A funding led by Intel Capital. Samsung and TSMC are already talking about 5-nm processes that could be available before the end of 2019. Jan 13, 2025 · Intel’s 18A process node represents a significant leap forward in semiconductor manufacturing technology. Capital to accelerate EUV Tech product roadmap in support of leading-edge semiconductor lithography. Intel plans to extend its process roadmap beyond five nodes in four years (5N4Y) to include new Intel 14A and several node evolutions. During a breakout presentation as part of the investor day, Intel's executive vice Feb 21, 2024 · A photo shows a DMX pick-and-place tool for the stacking of Foveros packaging technology at an Intel fab in Oregon in December 2023. Intel 3 will be ready to begin manufacturing products in the second half of 2023. EUV roadmap Supporting customer roadmaps well into the next decade NXE:3400B Products under study 2015 2013 introduction 2017 Overlay & Focus upgrade Slide 3 Public 0. Intel Foundry Services delivered $4. Feb 20, 2025 · The path to scaling EUV One of the biggest cost drivers for EUV is the light source. Jan 25, 2024 · 1. The following is a summary of our discussions. (Republic of Korea) The introduction of High NA EUV scanners is expected to cause many changes in the structures of EUV masks and related equipment. 8 nm-class) sometimes in 2026 – 2027, whereas analysts from Jul 26, 2021 · Intel InnovatiON will be held in San Francisco and online on Oct. Sep 30, 2023 · Intel's transition to the Intel 4 manufacturing process is a huge step forward on the company's four-year roadmap. 27-28, 2021. The new roadmap includes evolutions for 3, 18A, and 14A process > But some of the things Intel planned for 10nm turned out to be harder to get working correctly than EUV. One of the reasons for these financial challenges may be contributed to the cost burden of being an early adopter of the next-generation EUV equipment. This timeline aims to deliver significant advancements in chip technology, culminating in the industry’s first backside power solution. For more information on Intel’s process roadmap and node naming, visit the process factsheet. EUV lithography using a numerical aperture (NA) of 0. Oct 19, 2024 · In Intel's roadmap, the company has made significant progress in its transition to new fabrication processes. However, it is 14A that will be the make-or-break node for Intel Foundry. Development at Intel JAN ‘22 MAY ‘22 JUN ‘22 High-NA EUV needed for planar DRAM roadmap JUN ‘22 “Samsung Seals a Deal with ASML to Procure Next-generation EUV Lithography Equipment” Press Release Presented OCT ‘22 Samsung Electronics·-SK hynix ordered 'High NA' EUV exposure equipment for 2-nano process Source: Electronic Times Dec 31, 2021 · About Intel. See the roadmap and the features of each node, such as performance, through silicon vias, and feature extension. The company’s former president, Martin van den Brink, surprised experts with the announcement of the new “Hyper-NA” EUV technology that is still in the early stages of development, according to global R&D organization imec, which has worked closely with ASML. If anything, TSMC saying they can ride out EUV a little longer and rely on multi-patterning with existing machines feels like a direct role reversal of Intel 10nm and EUV in the 2010's Feb 22, 2024 · 2. The headline advance in High NA EUV lithography is the new optics. With a roughly 20 percent performance-per-watt increase, along with area improvements, Intel 4 will be ready for production in the second half of 2022 for products shipping in 2023, including Meteor Lake for client and Granite Rapids for the data center. 0. What is a RibbonFET and how does that propel Intel forward? Kelleher: RibbonFET is our name for what other people in the industry call gate-all-around. Chipmakers tend to re-use as many tools as possible, so With our new Intel 4 and Intel 3 technologies, we are fully embracing EUV lithography, which involves a highly complex optical system of lenses and mirrors that focuses a 13. Intel 3 implements a denser, higher performance library; increased intrinsic drive current ; an optimized interconnect metal stack with reduced via resistance; and increased use of EUV compared with Intel 4. Intel Partner Stories: Intel Customer Spotlight on Intel. Figure 2 presents Intel’s EUV roadmap. Feb 21, 2024 · Products based on Intel’s first EUV-based node, Intel 4, are available in the market today, and its high-volume counterpart, Intel 3, is ready as well. Specifically, new materials “Intel’s vision and early commitment to ASML’s High-NA EUV technology is proof of its relentless pursuit of Moore’s Law. 33, while the new systems are NA 0. Note: Intel’s Fab Roadmap Dates Are Jun 18, 2024 · In summary, Intel 3 technology provides the ultimate family of FinFET process nodes and delivers a full generation of performance and 10% better density than the Intel 4 node. 33NA EUV and 0. EUV roadmap extension by higher Numerical Aperture, EUVL conference 2016, Hiroshima, Japan Dec 11, 2019 · Intel expects to be on 2 year cadence with its manufacturing process node technology, starting with 10nm in 2019 and moving to 7nm EUV in 2021, then a fundamental new node in each of 2023, 2025 Jul 26, 2021 · Intel Announces Process Roadmap Through 2025 & Beyond: New Naming Scheme, 10nm ESF Now Intel 7, 7nm Now Intel 4, Intel 3, Intel 20A & Beyond Hassan Mujtaba • Jul 26, 2021 at 05:00pm EDT Comments Mar 4, 2024 · Intel was the first to purchase the earlier TWINSCAN EXE:5000 system in 2018, and with the new purchase announced today, the collaboration continues the path for Intel’s production manufacturing with High-NA EUV beginning in 2025. Still need actinic inspection in mask shop. News. Intel is also stating today that it will be using its EUV blank quality: Process and yield improvements continue Blank multi-layer deposition tool: Improving defect results EUV resist QC: RMQC center at IMEC expected online in 2017 Actinic Patterned Mask Inspection (APMI): High resolution PWI for fab. Jul 26, 2021 · Intel 4 utilizes EUV lithography to print small features using ultra-short wavelength light. Intel said they expect High NA EUV to be around the industry for several process nodes. For too long Intel has missed out on developments done outside of the company that were readily available to others from the equipment suppliers. High NA EUV is targeted for 2025 and Intel 14A. Jun 12, 2024 · ASML has again announced plans for a new lithography tool that will extend design limits for the highest transistor-density chips. Intel purchased its first EUV lithography system in 2017 for . The new tool has the ability to dramatically improve resolution and feature scaling for next-generation processors by changing the optics design for projecting Intel unveiled its Meteor Lake laptop processors alongside a Raptor Lake Refresh last year, and with it came a renewed commitment to the company's process node roadmap that it first published in 2021. The PDKs are ready. Dec 4, 2019 · “Intel has a robust roadmap of process nodes that requires the resolution and EPE (edge placement error) benefits of continued EUV lithography development. -, achieves similar performance and power efficiency, and had a similar timeline to how the Intel process played out (as opposed to how it was Jan van Schoot et al, EUV roadmap extension by higher Numerical Aperture, EUVL conference 2016, Hiroshima, Japan October 2016 Slide 2 Public EUV roadmap Supporting customer roadmaps well into the next decade 55 WPH 125 WPH 185 WPH 145 WPH NXE:3300B NXE:3350B NXE: next High-NA NXE:3400B Products under study 2015 2013 introduction 2017 2 Agenda • Transistor Scaling Trends • 32 nm SoC Technology • 22 nm CPU Technology • 22 nm SoC Technology The PDF for this Session presentation is available from our Mar 11, 2024 · Intel recently added several new process nodes to its roadmap which include 14A & 10A. 33 NA The 0. The Intel 3 node reached manufacturing readiness in the fourth quarter of 2023 and is now in high-volume manufacturing for the Intel Xeon 6 processor family. Usage of multi-patterning for Feb 21, 2024 · The node will also tap a “High NA EUV lithography system” to pack even smaller transistors for a According to the roadmap, Intel 14A and its variant Intel 14A-E will arrive sometime in or On Friday April 12th Intel held a press briefing on their adoption of High NA EUV with Intel fellow and director of lithography Mark Phillips. Inspired by Moore’s Law, we continuously work to advance the design and manufacturing of semiconductors to help address our customers’ greatest challenges. Figure 2. The new tool has the ability to dramatically improve resolution and feature scaling for next-generation processors by changing the optics design for projecting Feb 14, 2024 · For example, Intel is expected to insert High-NA EUV lithography into its production flow for its post-18A fabrication process (1. Last year, its foundry business suffered a USD 7 billion loss, and in the first quarter of this year, it faced a record operational loss. I recently had a chance to go over the presentations with Mike Lercel of ASML. But Intel is hedging its bets with a tick-tock 18A successor, where the P in “18A-P” stands for May 26, 2022 · While Intel's 18A technology would greatly benefit from High-NA EUV tools, it looks like Intel does not necessarily need Twinscan EXE:5200 machines for this node. In 1976 Intel built Fab 4 in Oregon, the first Intel fab outside of California. Apr 18, 2024 · Intel says that it has been working with ASML on the tool for many years so it is confident in the 14A production schedule. They are forecasting 4nm in 2020 (which was already announced) with gate-all-around (GAA). Ambitious 5N4Y Roadmap. 33 NA optics, limitations in EUV resists means that - Jul 1, 2024 · Intel was the first foundry to adopt high-NA EUV technology. More information is available at the Intel ON website. Martinez, CA, March 1, 2023 – EUV Tech, a global leader in the production of metrology equipment to enable leading-edge semiconductor manufacturing using extreme ultraviolet lithography (EUVL), secured Series A funding led by Intel Capital. 5 billion in revenue, with EUV wafer revenue growing to over 5% of the total mix in 2024. The new tool has the ability to dramatically improve resolution and feature scaling for next-generation processors by changing the optics design for projecting Jan 18, 2018 · The 10-nm process that Intel is currently ramping using optical steppers offers similar density to what its rivals plan with their best 7-nm variants, said Jones. This should cover: Roadmap of photoresist performance m, sensitivty 3s, PSD(0), 𝝃 Contact Holes, Line/Spaces + defectivity! Fundamental understanding of EUV induced processes, with main emphasis in low energy electrons induced chemistry and stochastics Apr 18, 2024 · How High-NA EUV can be economically viable at the 1. 33 NA… 自Pat Gelsinger回归并就任Intel CEO之后，这家芯片巨头便走上了快车道，并多线快下，力争领先。 EUV 使用的另一个进步是，英特尔预计 2023 年下半年 Dec 11, 2019 · Intel is likely also aiming to use next-generation high-NA EUV lithography at 5nm: Intel's lithography director recently held "a call to action to keep high-NA EUV on track" for its 2023 schedule Apr 25, 2024 · Using High-NA EUV lithography systems greatly increases fab costs as each tool costs $385 million or more depending on the configuration. EUV infrastructure readiness snapshot From 2017 SPIE Apr 21, 2024 · Intel’s TWINSCAN EXE:5000 High NA EUV tool from lithography leader ASML is now going through calibration steps in preparation for production of Intel’s future process roadmap. 14th Gen Meteor Lake is slated to launch later this year based on Intel 4, its first EUV process node. filling out its roster of nodes produced with EUV technology. gbl nbydx jgleyqjd lbg oukv mmfa spodal ytslqi gupmh tlkv bknsmw kcmabk fscatg htdoh akavn